Effect of Low-temperature Plasma Pretreatment on Hot-air with Thin-layer Drying Characteristics of Potatos
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Graphical Abstract
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Abstract
In order to achieve the efficient drying of potatoes, shorten the drying time and improve the drying efficiency. In this study, low-temperature plasma technology was used to pretreat potatos for hot-air with thin-layer drying experiment. Study on different plasma pretreatment time (20, 30, 40, 50, 60 s), plasma pretreatment power (100, 200, 300, 400, 500 W) and drying temperature (50, 70, 90 ℃) conditions of drying characteristics, and compared it with unpretreated potatoes. The research results showed that plasma pretreatment could effectively accelerate the drying rate and shorten the drying time.The effective moisture diffusivity was in the range of 3.785×10−11~11.868×10−11 m2/s. After pretreatment power of 500 W for 30 s at 70 ℃, drying time was shortened by a maximum of 35.71%, compared with the control group. This research put forward new ideas for the research of potato hot-air drying pretreatment methods, discussed the application of plasma technology in new fields, and provided new reference and theoretical basis for the research of potato high-efficiency drying pretreatment technology.
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